Laserska litografija

Laserska litografija

V litografskih strojih svetlobno občutljive polimere ali fotoreziste izpostavimo UV svetlobnemu viru in jih nato razvijemo s kemičnimi sredstvi. Tako oblikujemo 3D reliefe ali predmete na nosilnem substratu.

Strojna fakulteta-LADHE
MIDALIX maskless litography systems

 Substrate size, mm                                               from sub-millimeter to 100 x 100 x 10

Supported photoresists                                       all common photoresists

Laser wavelength, nm                                          375 or 405

Laser beam spot size, µm                                    1 and 3 (software-selectable)

Writing resolution (beam positioning)            true sub-nanometer

Writing speed (spots per second), Hz              100,000

Minimum structure size, µm                             <1

Structure aspect ratio                                          more than 1:20

Multilayer alignment accuracy, µm                 0.5

Data input formats                                             DXF, BMP

Intuitive CAD software for design, alignment, advanced anchoring and exposure control
Integrated optical monochrome or color microscope for inspection and alignment
Technical Data

Operating temperature, °C                                 21.5 ± 1.5

Operating relative humidity, %                        <80, non-condensing

System dimensions (W x D x H), mm              650 x 626 x 522

System weight, kg                                                 77

Electrical supply voltage                                     110-230 VAC, 50/60 Hz

Power consumption, VA                                     <120

Hardware/software requirements        

Windows 10 / 8.1 / 8, 64 bit, 3 GHz processor with SSE2 or higher, 4 GB of RAM and 16 GB available hard disk space

Chiller data
133 x 483 x 559 mm³ (19” rack, 3U), 15 kg, 250 W cooling / heating capacity
The DaLI system is shipped with the chiller, all connecting cables, coolant hoses and the proprietary DaLI software.