Laserska litografija
Laserska litografija
V litografskih strojih svetlobno občutljive polimere ali fotoreziste izpostavimo UV svetlobnemu viru in jih nato razvijemo s kemičnimi sredstvi. Tako oblikujemo 3D reliefe ali predmete na nosilnem substratu.
MIDALIX maskless litography systems
Substrate size, mm from sub-millimeter to 100 x 100 x 10
Supported photoresists all common photoresists
Laser wavelength, nm 375 or 405
Laser beam spot size, µm 1 and 3 (software-selectable)
Writing speed (spots per second), Hz 100,000
Minimum structure size, µm <1
Structure aspect ratio more than 1:20
Multilayer alignment accuracy, µm 0.5
Data input formats DXF, BMP
Technical Data
Operating temperature, °C 21.5 ± 1.5
Operating relative humidity, % <80, non-condensing
System dimensions (W x D x H), mm 650 x 626 x 522
System weight, kg 77
Electrical supply voltage 110-230 VAC, 50/60 Hz
Power consumption, VA <120
Hardware/software requirements
Windows 10 / 8.1 / 8, 64 bit, 3 GHz processor with SSE2 or higher, 4 GB of RAM and 16 GB available hard disk space