Photolithography
Laser litography
With the help of lithography machines light sensitive polymers or photoresists are exposed by UV light source and developed with chemical means to form 3D relief images or objects on carrying substrate.
MIDALIX maskless litography systems
Substrate size, mm from sub-millimeter to 100 x 100 x 10
Supported photoresists all common photoresists
Laser wavelength, nm 375 or 405
Laser beam spot size, µm 1 and 3 (software-selectable)
Writing speed (spots per second), Hz 100,000
Minimum structure size, µm <1
Structure aspect ratio more than 1:20
Multilayer alignment accuracy, µm 0.5
Data input formats DXF, BMP
Technical Data
Operating temperature, °C 21.5 ± 1.5
Operating relative humidity, % <80, non-condensing
System dimensions (W x D x H), mm 650 x 626 x 522
System weight, kg 77
Electrical supply voltage 110-230 VAC, 50/60 Hz
Power consumption, VA <120
Hardware/software requirements
Windows 10 / 8.1 / 8, 64 bit, 3 GHz processor with SSE2 or higher, 4 GB of RAM and 16 GB available hard disk space
Chiller data
Questions?
Do not hesitate to contact us via e-mail or by telephone. You can also visit us at the Faculty of Mechanical Engineering in Ljubljana
Aškerceva ul. 6
1000 Ljubljana
Slovenia